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Molecular beam deposition of high quality silicon oxide dielectric films

✍ Scribed by Naresh Chand; J.E. Johnson; J.W. Osenbach; W.C. Liang; L.C. Feldman; W.T. Tsang; H.W. Krautter; M. Passlack; R. Hull; V. Swaminathan


Book ID
103171055
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
687 KB
Volume
148
Category
Article
ISSN
0022-0248

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Optical and structural properties of sil
✍ Nikitin, Timur ;Aitola, Kerttu ;Novikov, Sergei ;RΓ€sΓ€nen, Markku ;Velagapudi, Ra πŸ“‚ Article πŸ“… 2011 πŸ› John Wiley and Sons 🌐 English βš– 365 KB

## Abstract We compare optical and structural properties of silicon‐rich silicon oxide (SiO~__x__~, __x__∼1.8) films obtained by ion implantation and molecular beam deposition (MBD). Before annealing, amorphous clusters (β‰₯2 nm) are present in the MBD samples whereas these are absent for ion implant