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Modulated photoreflectance characterization of ion-implanted semiconductor wafers

โœ Scribed by Z. L. Qian; S. Y. Zhang; Y. S. Lu; Z. Q. Wang


Publisher
Springer
Year
1994
Tongue
English
Weight
382 KB
Volume
58
Category
Article
ISSN
1432-0630

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Polyethylene (PE) film was implanted with 1000-keV Ar / ions to a fluence of 5 1 10 14 ions/cm 2 under high vacuum conditions (2.5 1 10 06 torr) and the film surface was investigated by means of microhardness and microwear measurements, and FTIR/ATR, Raman, and XPS techniques. Ion implantation signi