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Modeling the infrared reflectance of n–/n+ SiC layers on top of n+ SiC substrates for epitaxy control application

✍ Scribed by Camassel, J. ;Pernot, J. ;Wang, H. Y. ;Peyre, H.


Publisher
John Wiley and Sons
Year
2003
Tongue
English
Weight
316 KB
Volume
195
Category
Article
ISSN
0031-8965

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The n-GaAs layer was successfully grown on (1 0 0) p-type silicon (p-Si) substrate by molecular beam epitaxy (MBE) using rough surface buffer layer (RSi) to reduce the tensile stress in GaAs layer grown on Si substrate. We have reviewed the initial stage and the recombination of GaAs epitaxial layer