✦ LIBER ✦

Modeling the elementary steps of low-pressure diamond deposition

✍ Scribed by Prof. Jürgen Biener; Uwe. A. Schubert; Angelika Schenk; Dr. Bernd Winter; Dr. Carsten Lutterloh; Prof. Jürgen Küppers

Publisher: John Wiley and Sons
Year: 1993
Tongue: English
Weight: 573 KB
Volume: 5
Category: Article
ISSN: 0935-9648
DOI: 10.1002/adma.19930050909

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Low-pressure microwave plasma nucleation

Low-pressure microwave plasma nucleation and deposition of diamond films

✍ Y.H. Shing; F.S. Pool; D.H. Rich 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 584 KB

Carburization of tungsten and tantalum f

Carburization of tungsten and tantalum filaments during low-pressure diamond deposition

✍ S. Okoli; R. Haubner; B. Lux 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 766 KB

A finite element modeling of the low pre

A finite element modeling of the low pressure plasma deposition process—I: Temperature analysis

✍ Daeyong Lee 📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 522 KB

A finite element modeling of the low pre

A finite element modeling of the low pressure plasma deposition process—II: Stress analysis

✍ Daeyong Lee 📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 693 KB

Elementary reaction step model of the N-

Elementary reaction step model of the N-nitrosation of ammonia

✍ Gabriel Da Silva; Bogdan Z. Dlugogorski; Eric M. Kennedy 📂 Article 📅 2007 🏛 John Wiley and Sons 🌐 English ⚖ 495 KB

## Abstract This contribution develops a comprehensive kinetic model of the N‐nitrosation reaction mechanism, consisting almost entirely of elementary reaction steps and applies it to study the nitrosation of ammonia. The reaction mechanism features 26 species and 22 reactions, with 8 parallel reac

Kinetics and modeling of low pressure ch

Kinetics and modeling of low pressure chemical vapor deposition of Si1−xGex epitaxial thin films

✍ I.-M. Lee; W.-C. Wang; G.W. Neudeck; C.G. Takoudis 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 397 KB