๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Modeling of CrSi2-Si and MoSi2-Si Schottky barrier contacts

โœ Scribed by Donoval, D.; Snowden, C.M.; Nagl, V.; Racko, J.; Barus, M.


Book ID
114536097
Publisher
IEEE
Year
1995
Tongue
English
Weight
274 KB
Volume
42
Category
Article
ISSN
0018-9383

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Structure and properties of CrSi2/Si mul
โœ D. Decker; E. Loos; Chr. Drobniewski; A. Mogilatenko; J. Schumann; G. Beddies; H ๐Ÿ“‚ Article ๐Ÿ“… 2004 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 302 KB
Epitaxial growth of CrSi and CrSi2 on Si
โœ P. Wetzel; C. Pirri; J.C. Peruchetti; D. Bolmont; G. Gewinner ๐Ÿ“‚ Article ๐Ÿ“… 1988 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 326 KB