Modeling and analysis of modified chemical vapor deposition of optical fiber preforms

✍ Scribed by Kyo-Seon Kim; Pratsinis Sotiris E.

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 866 KB
• Volume: 44
• Category: Article
• ISSN: 0009-2509
• DOI: 10.1016/0009-2509(89)85191-7

✦ Synopsis

A theoretical analysis of modified chemical vapor deposition (MCVD) for the manufacture of optical waveguides is presented. The Navier-Stokes equations are solved, including continuity, momentum, energy and mass balance equations for gas components and SiO, particles accounting for heat transfer. chemical reaction, convection, gas diffusion and SiO, thermophoresis. The effects of process variables (gas flow rate and inlet SiCl, concentration) on MCVD operation are examined. The heat of reaction reduces the radial diffusion of the precursor gas and, subsequently, the MCVD deposition efficiency. Employing helium as the carrier gas results in the fastest reaction and deposition rates, but exhibits the lowest deposition efficiency of the process. High process yields are favored by high inlet SiCl, concentrations and fast gas flow rates through the preform tube.