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Model for oxidation of TiN in ion-beam-assisted deposition process

✍ Scribed by H. Kubota; M. Easterbrook; M. Tokunaga; I. Sakata; M. Nagata; M.A. Nicolet

Book ID
113205275
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
415 KB
Volume
281-282
Category
Article
ISSN
0040-6090

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πŸ“œ SIMILAR VOLUMES

Indium tin oxide thin films prepared by
Indium tin oxide thin films prepared by ion beam assisted deposition technique at different ion beam currents
✍ Meng, Lijian ;Gao, Jinsong ;Teixeira, V. ;dos Santos, M. P. πŸ“‚ Article πŸ“… 2008 πŸ› John Wiley and Sons 🌐 English βš– 664 KB

## Abstract Indium tin oxide (ITO) films have been deposited onto glass substrates at room temperature by ion beam assisted deposition technique (IBAD) at different ion beam currents (80–120 mA). The effect of the ion beam current on films properties has been studied. The films prepared at low ion