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Model approach to solving the inverse problem of X-ray reflectometry and its application to the study of the internal structure of hafnium oxide films

✍ Scribed by Yu. O. Volkov, I. V. Kozhevnikov, B. S. Roshchin, E. O. Filatova, V. E. Asadchikov

No coin nor oath required. For personal study only.

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