MOCVD of MgAl2O4 thin films using new single molecular precursors: application of β-hydrogen elimination to the growth of heterometallic oxide films

✍ Scribed by Boo, J.-H.; Lee, S.-B.; Ku, S.-J.; Koh, W.; Kim, C.; Yu, K.-S.; Kim, Y.

• Book ID: 108416329
• Publisher: Elsevier Science
• Year: 2001
• Tongue: English
• Weight: 275 KB
• Volume: 169-170
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/s0169-4332(00)00710-8