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Mobile ion instability in SiO2 films on silicon : B. P. Rai and R. S. Srivastava. Int. J. Electron.46, (4) 381 (1979)

Publisher: Elsevier Science
Year: 1979
Tongue: English
Weight: 130 KB
Volume: 19
Category: Article
ISSN: 0026-2714
DOI: 10.1016/0026-2714(79)90544-4

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📜 SIMILAR VOLUMES

Dielectric breakdown properties in silic

Dielectric breakdown properties in silicon dioxide films : B. P. Rai, K. Singh and R. S. Srivastava. Int. J. Electron.41 (1), 99 (1976)

📂 Article 📅 1976 🏛 Elsevier Science 🌐 English ⚖ 126 KB