Dielectric breakdown properties in silicon dioxide films : B. P. Rai, K. Singh and R. S. Srivastava. Int. J. Electron.41 (1), 99 (1976)

• Publisher: Elsevier Science
• Year: 1976
• Tongue: English
• Weight: 126 KB
• Volume: 15
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(76)90572-2