Mo- and Ti-silicided low-resistance shallow junctions formed using the ion implantation through metal technique

✍ Scribed by Nagasawa, E.; Okabayashi, H.; Morimoto, M.

• Book ID: 114595916
• Publisher: IEEE
• Year: 1987
• Tongue: English
• Weight: 771 KB
• Volume: 34
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/t-ed.1987.22966