A1N layers were elaborated on SiC substrates using the method of low-pressure chemical vapour deposition ( LPCVD ). The oxMation of these layers was studied in an X-ray diffkaction chamber at temperalures between 900 and 1400~C with an oxygen flow (20 SCCM ) at a pressure of 85 x 103 Pa. The oxidat
Misfit dislocations in highly mismatched oxide interfaces, an X-ray diffraction study
✍ Scribed by Conchon, F. ;Boulle, A. ;Guinebretière, R.
- Publisher
- John Wiley and Sons
- Year
- 2007
- Tongue
- English
- Weight
- 239 KB
- Volume
- 204
- Category
- Article
- ISSN
- 0031-8965
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✦ Synopsis
Abstract
We present here a detailed study describing the strain relaxation mechanisms occurring in the highly mismatched ZrO~2~/MgO system. Especially, we show using reciprocal space mapping that the ZrO~2~ islands epitaxially grown on the MgO substrate are fully relaxed implying the formation of misfit dislocations at the interface. Furthermore, an analysis of transverse scans performed through symmetrical ZrO~2~ reflections for several azimuthal positions of the sample lets us conclude that dislocations form a square network parallel to ZrO~2~ cell axes. Finally, an accurate analysis of the diffraction data evidences the existence of two subsets of misfit dislocations. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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