✦ LIBER ✦

Microwave etching device for reactive ion etching

✍ Scribed by H. Schmid

Book ID: 108025631
Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 753 KB
Volume: 139
Category: Article
ISSN: 0921-5093
DOI: 10.1016/0921-5093(91)90650-c

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## Abstract Deep reactive ion etching at cryogenic temperatures has been used for a macropore formation in silicon. A double‐mask set‐up was applied. The first mask of a patterned thin aluminum or silicon oxide layer determined the pore size and density, and thicker patterns of silicon, glass, or S