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Microwave and hot filament chemical vapour deposition of diamond multilayers on Si and WC–Co substrates

✍ Scribed by M. Kadlečíková; M. Vojs; J. Breza; M. Veselý; Z. Frgala; M. Michalka; J. Matějková; A. Vojačková; T. Daniš; M. Marton

Book ID
104051264
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
796 KB
Volume
38
Category
Article
ISSN
0026-2692

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✦ Synopsis

A serious problem in the use of chemical-vapour-deposited polycrystalline diamond coatings in electronics, optics as well as in cutting tools is the high surface roughness. In our work, microcrystalline and nanocrystalline diamond films with a thickness of 0.5-5 mm were deposited using microwave chemical vapour deposition (MW CVD), and with a thickness of 1-4 mm by hot filament chemical vapour deposition (HF CVD). For both deposition technologies, we investigated the effect of a negative bias upon the formation of microcrystalline and nanocrystalline diamond multilayers. In the cases of smooth Si and relief WC-Co substrate surfaces, the multilayers were found to have a ''cauliflower'' look. The structure and composition of deposited layers were checked by scanning electron microscopy and Raman spectroscopy.

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## Abstract Porous diamond (PD) films have been grown on sintered WC‐13 wt.%Co substrates by bias enhanced hot filament (HF) chemical vapour deposition (CVD) methods and characterized by scanning electron microscopy (SEM), laser Raman spectroscopy and X‐ray diffraction (XRD). The PD films show exce