Microtwinning in highly nonstoichiometric VOx thin films

✍ Scribed by Jing Li; Bryan D. Gauntt; Elizabeth C. Dickey

• Book ID: 103999117
• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 701 KB
• Volume: 58
• Category: Article
• ISSN: 1359-6454
• DOI: 10.1016/j.actamat.2010.05.035

✦ Synopsis

Both pulsed-DC biased and commercial ion-beam sputtered VO x thin films maintain a face-centered-cubic nanocrystalline phase, even for stoichiometries of x > 1.5, which is well outside the bulk equilibrium solubility range for cubic VO x . Many of these highly nonstoichiometric films exhibit a high density of microtwins, which give rise to unusual fine structure in the selected-area electron diffraction patterns, namely: an additional defect ring; a significant broadening of the {2 0 0} ring; pairs of parallel rod features which are tangent to the additional defect ring; and additional fine-structure features between the {2 0 0} and {2 2 0} rings. The formation of the microtwins is correlated with the coalescence of vanadium vacancies along the {1 1 1} twin planes in the crystalline lattice.