Microstructure evolution of Ge+ implanted silicon oxide thin films upon annealing treatments

✍ Scribed by R.S. Yu; M. Maekawa; A. Kawasuso; T. Sekiguchi; B.Y. Wang; X.B. Qin; Q.Z. Wang

• Book ID: 108224577
• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 303 KB
• Volume: 267
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2009.06.028