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Microstructure and thermal stability of Ti1-xAlxN coatings deposited by reactive magnetron co-sputtering

✍ Scribed by Miao Du; Lei Hao; Xiaopeng Liu; Lijun Jiang; Shumao Wang; Fang Lv; Zhinian Li; Jing Mi

Book ID
113846550
Publisher
Elsevier
Year
2011
Tongue
English
Weight
901 KB
Volume
18
Category
Article
ISSN
1875-3892

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The studies of thermal stability of nitride coatings are important since their structural, thermal, electrical and optical properties are drastically modified by the oxidation layer formed on the top of these coatings. Tungsten nitride films were deposited from metallic tungsten target using reactiv