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Microstructure and residual stress of very thin Mo films

✍ Scribed by D.P. Adams; L.J. Parfitt; J.C. Bilello; S.M. Yalisove; Z.U. Rek

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 771 KB
Volume: 266
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(95)00603-6

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