Microscopy of extreme ultraviolet lithography masks with 132 nm tabletop laser illumination

✍ Scribed by Brizuela, F.; Wang, Y.; Brewer, C. A.; Pedaci, F.; Chao, W.; Anderson, E. H.; Liu, Y.; Goldberg, K. A.; Naulleau, P.; Wachulak, P.

• Book ID: 115431442
• Publisher: Optical Society of America
• Year: 2009
• Tongue: English
• Weight: 299 KB
• Volume: 34
• Category: Article
• ISSN: 0146-9592
• DOI: 10.1364/OL.34.000271