At-wavelength inspection of sub-40 nm defects in extreme ultraviolet lithography mask blank by photoemission electron microscopy

✍ Scribed by Lin, Jingquan; Weber, Nils; Maul, Jochen; Hendel, Stefan; Rott, Karsten; Merkel, Michael; Schoenhense, Gerd; Kleineberg, Ulf

• Book ID: 115429761
• Publisher: Optical Society of America
• Year: 2007
• Tongue: English
• Weight: 275 KB
• Volume: 32
• Category: Article
• ISSN: 0146-9592
• DOI: 10.1364/OL.32.001875