AbStlXt A microwave plasma based on a capacitively coupled microwave plasma was developed and several dlagnostlcal parameters were evaluated This plasma was sustained at powers as low as 25 W with He as the plasma gas RotatIonal (2500 K) and excltatlon (4500 K) temperatures were determined from N: a
Microsample introduction by tungsten filament electrode into capacitively coupled microwave plasma for atomic emission spectroscopy: analytical figures of merit
โ Scribed by Abdalla H. Ali; James D. Winefordner
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 508 KB
- Volume
- 264
- Category
- Article
- ISSN
- 0003-2670
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โฆ Synopsis
Ahstlnct A tungsten filament electrode for sample mtroduction mto a capacltwely coupled nucrowave plasma (CCMP) IS described for its use m atomic enusslon spectroscopy (AES) Samples vaportze rapldly off the filament and are excited m the mlcrowave plasma upon the mltlatlon of the rmcrowave discharge The maxunum emlsslon signals of He and Cu were found at smular spatial coordmates, gas flow-rates and mlcrowave powers The addmoon of 100 ml mm -* hydrogen dopant mto the plasma gas suppressed both the background and enusslon from the tungsten The filament temperature increased with the power The absolute detectlon IunIts of 12 elements were wlthm the range of 1 to 100 pg The hnear dynanuc range was 3-4 orders of magmtude, and precnlon was better than 10%
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