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Microsample introduction by tungsten filament electrode into capacitively coupled microwave plasma for atomic emission spectroscopy: diagnostics

โœ Scribed by Abdalla H. Ali; James D. Winefordner


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
519 KB
Volume
264
Category
Article
ISSN
0003-2670

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โœฆ Synopsis


AbStlXt A microwave plasma based on a capacitively coupled microwave plasma was developed and several dlagnostlcal parameters were evaluated This plasma was sustained at powers as low as 25 W with He as the plasma gas RotatIonal (2500 K) and excltatlon (4500 K) temperatures were determined from N: and Fe, respectwely The rotational and excltatlon temperatures were independent of power (35-l 15 W), radial (-3 to + 3 mm) and axial (l-7 mm) positions, and the He plasma gas flow-rate (4-8 1 mu-') The excitation temperature decreased slightly with plasma gas flow-rate between 3 and 4 1 mm-' while the rotational temperature remamed constant The electron density (4 x 1Ol4 cnC3) also remained unchanged with both power and radial distances


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Microsample introduction by tungsten fil
โœ Abdalla H. Ali; James D. Winefordner ๐Ÿ“‚ Article ๐Ÿ“… 1992 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 508 KB

Ahstlnct A tungsten filament electrode for sample mtroduction mto a capacltwely coupled nucrowave plasma (CCMP) IS described for its use m atomic enusslon spectroscopy (AES) Samples vaportze rapldly off the filament and are excited m the mlcrowave plasma upon the mltlatlon of the rmcrowave discharge