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Micromagnetic simulation of effect of stress-induced anisotropy in soft magnetic thin films

✍ Scribed by Bai, Daniel Z.


Book ID
127029926
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
409 KB
Volume
95
Category
Article
ISSN
0021-8979

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Stress-induced magnetic anisotropy in Xe
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Samples consisting of 75 nm Ni films deposited on Si substrates were bent mechanically and irradiated with 200 keV Xe-ions at a dose of 4 β€’ 10 14 ions/cm 2 . Magneto-optical Kerr effect, Rutherford backscattering spectrometry and X-ray diffraction were used to investigate the changes in the magnetic