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Development of a tensile-stress-induced anisotropy in amorphous magnetic thin films

✍ Scribed by K Mandal; M Vázquez; D Garcı́a; F.J Castaño; C Prados; A Hernando

Book ID
114223546
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
684 KB
Volume
220
Category
Article
ISSN
0304-8853

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✍ Kun Zhang 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 435 KB

Samples consisting of 75 nm Ni films deposited on Si substrates were bent mechanically and irradiated with 200 keV Xe-ions at a dose of 4 • 10 14 ions/cm 2 . Magneto-optical Kerr effect, Rutherford backscattering spectrometry and X-ray diffraction were used to investigate the changes in the magnetic