Stress-induced magnetic anisotropy in Xe
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Kun Zhang
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Article
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2006
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Elsevier Science
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English
β 435 KB
Samples consisting of 75 nm Ni films deposited on Si substrates were bent mechanically and irradiated with 200 keV Xe-ions at a dose of 4 β’ 10 14 ions/cm 2 . Magneto-optical Kerr effect, Rutherford backscattering spectrometry and X-ray diffraction were used to investigate the changes in the magnetic