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Micro structure and properties of TiSiN films prepared by plasma-enhanced chemical vapor deposition

✍ Scribed by J.L. He; C.K. Chen; M.H. Hon

Book ID: 113300616
Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 818 KB
Volume: 44
Category: Article
ISSN: 0254-0584
DOI: 10.1016/0254-0584(95)01655-e

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