Micro-Raman stress characterization of polycrystalline silicon films grown at high temperature

✍ Scribed by R.C. Teixeira; I. Doi; M.B.P. Zakia; J.A. Diniz; J.W. Swart

• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 127 KB
• Volume: 112
• Category: Article
• ISSN: 0921-5107
• DOI: 10.1016/j.mseb.2004.05.025