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Method for Simulating the Thickness Distribution of a Cubic Boron Nitride Film Deposited on a Curved Substrate using Ion-beam-assisted Vapor Deposition

✍ Scribed by T. Kobayashi; R. Valizadeh; J.S. Colligon; H. Kanematsu; K. Morisato

No coin nor oath required. For personal study only.

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