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Metalorganic vapor-phase epitaxy of p-type ZnSe and p/n junction diodes

โœ Scribed by Shizuo Fujita; Shigeo Fujita


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
411 KB
Volume
145
Category
Article
ISSN
0022-0248

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We report the growth of a p + -n + -GaAs tunnel diode by atmospheric pressure metalorganic vapour phase epitaxy (MOVPE), using carbon (C) and silicon (Si) as p-type and n-type dopants, respectively. The more efficient incorporation of silicon on donor sites and carbon on acceptor sites, results in a