Approach to control deposition of ultra
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Igor K. Igumenov; Pyotr P. Semyannikov; Sergei V. Trubin; Natalia B. Morozova; N
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Article
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2007
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Elsevier Science
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English
β 775 KB
Atomic layer deposition (ALD) processes have attracted attention during the past decade as a method allowing one to obtain high-quality thin films of various materials including metal oxides, metal nitrides and pure metals. Here we investigated a novel pulse method for the deposition of ultra thin f