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Mechanisms of etching and polymerization in radiofrequency discharges of CF4–H2, CF4–C2F4, C2F6–H2, C3F8–H2

✍ Scribed by d’Agostino, R.; Cramarossa, F.; Colaprico, V.; d’Ettole, R.

Book ID: 121846542
Publisher: American Institute of Physics
Year: 1983
Tongue: English
Weight: 576 KB
Volume: 54
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.332193

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