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Measuring system for photoresist development parameters

โœ Scribed by Atsushi Sekiguchi; Toshiharu Matsuzawa; Youichi Minami

Publisher
John Wiley and Sons
Year
1996
Tongue
English
Weight
781 KB
Volume
79
Category
Article
ISSN
8756-663X

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โœ Thomas A. Carroll; W. Fred Ramirez ๐Ÿ“‚ Article ๐Ÿ“… 1990 ๐Ÿ› American Institute of Chemical Engineers ๐ŸŒ English โš– 623 KB

The development phase of the optical photolithography process has long been considered the most crucial, as it is the final image-forming step. Process monitoring methods have focused primarily on end point detection and have not used other inferable on-line information. This paper examines the use