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Measurements of the electrical impurity profile of implanted ions, using the pulsed MOS C-V technique : J. Verjans and R. J. Van Overstraeten. Solid State Electronics18, 911 (1975)

Publisher: Elsevier Science
Year: 1976
Tongue: English
Weight: 59 KB
Volume: 15
Category: Article
ISSN: 0026-2714
DOI: 10.1016/0026-2714(76)90371-1

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Measurement of the electrical impurity p

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