Measurements of distribution of self-bias potential on an RF-plane electrode in plasma etching devices

✍ Scribed by K. Tsuzuki; T. Banno; A. Kinbara; Y. Nakagawa; T. Tsukada

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 505 KB
• Volume: 200
• Category: Article
• ISSN: 0022-3115
• DOI: 10.1016/0022-3115(93)90297-c