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Measurement of the sputtering yield by auger electron spectroscopy

✍ Scribed by H. Ohtsuka; R. Yamada; K. Sone; M. Saidoh; T. Abe


Publisher
Elsevier Science
Year
1978
Tongue
English
Weight
173 KB
Volume
76-77
Category
Article
ISSN
0022-3115

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Ion bombardment usually leads to a change in the equilibrium sputtered surface composition of compound semiconductors. This change is matrix dependent. To compensate for this sputter-induced e †ect in quantitative AES, a sputter yield correction factor is usually employed. This factor is based on th