AES Depth Profiling of Semiconducting Ep
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Procop, M.; Klein, A.; Rechenberg, I.; KrοΏ½ger, D.
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Article
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1997
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John Wiley and Sons
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English
β 426 KB
An ion beam technique has been developed that allows the preparation of bevels from semiconducting heteroepitaxial structures with smooth surfaces and very shallow angles between 0.1Γ and 0.001Γ. The bevels are used for AES depth proΓling of heterostructures by the line scan technique. Comparison of