๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Measurement of oxygen adsorption on silicon by ellipsometry

โœ Scribed by R.J. Archer; G.W. Gobeli


Publisher
Elsevier Science
Year
1965
Tongue
English
Weight
764 KB
Volume
26
Category
Article
ISSN
0022-3697

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Oxygen adsorption and reaction on alpha-
โœ Nagatomi, T.; Harada, Y.; Niwa, M.; Takai, Y.; Shimizu, R. ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 262 KB ๐Ÿ‘ 1 views

It is important to understand the initial stages of oxygen adsorption and reaction on alpha-silicon because of its importance in the development of nanometre silicon-based microelectronic devices. This was achieved effectively using precise background corrections applied to Si 2p x-ray photoelectron