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Measurement of latent tracks in amorphous SiO2 using small angle X-ray scattering

โœ Scribed by P. Kluth; C.S. Schnohr; D.J. Sprouster; A.P. Byrne; D.J. Cookson; M.C. Ridgway

Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
177 KB
Volume
266
Category
Article
ISSN
0168-583X

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