๐”– Bobbio Scriptorium
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Matt treatment of high-quality glassware using a plasma torch

โœ Scribed by I. I. Nemets; V. P. Krokhin; V. S. Bessmertnyi; A. I. Silko

Publisher
Springer US
Year
1983
Tongue
English
Weight
308 KB
Volume
40
Category
Article
ISSN
0361-7610

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Plasma CVD of high quality titanium nitr
Plasma CVD of high quality titanium nitride using titanium(IV)isopropoxide as precursor
โœ A. Weber; R. Poeckelmann; C.-P. Klages ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 336 KB

High-quality TiN films were deposited in an electron-cyclotron-resonance (ECR) plasma process at low substrate temperatures between 100 and 450ยฐC using titanium(IV)isopropoxide (TIP) {Ti[OCH(CH3)2]4} as a precursor. TIP was introduced into the downstream region of an ECR nitrogen or ammonia plasma.