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Mass transport characteristics in a pulsed plasma enhanced chemical vapor deposition reactor for thin polymer film deposition

✍ Scribed by Goyal, K.O.; Mahalingam, R.; Pedrow, P.D.; Osman, M.A.

Book ID: 114559148
Publisher: IEEE
Year: 2001
Tongue: English
Weight: 165 KB
Volume: 29
Category: Article
ISSN: 0093-3813
DOI: 10.1109/27.912940

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