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Maskless etching of ion modified chromium films

✍ Scribed by B. Spangenberg; K. Popova; E. Spasova; I.V. Katardjiev; G. Carter; M.J. Nobes

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 345 KB
Volume: 42
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(91)90093-x

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## Abstract Reactive ion‐plated chromium/carbon films exhibit a strong adherence and values of microhardness, which are clearly higher than those of pure chromium. Structure investigations by high resolution electron diffraction revealed microcrystallites of bcc Cr with mean diameters of some nm. I