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Mask characteristics for projection electron-beam lithography with demagnification imaging

✍ Scribed by Peng Kaiwu; Zhang Fuan; Wu Guijun; Gu Wenqi; Sun Xia; Kang Niankan; Pu Qirong; Ding Zejun

Book ID: 114155458
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 193 KB
Volume: 61-62
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(02)00533-6

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