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Monte Carlo simulation of electron transmission through the scattering masks with angular limitation for projection electron lithography

✍ Scribed by Sun, X.; Ding, Z. J.; Pu, Q. R.; Li, H. M.; Wu, Z. Q.; Gu, W. Q.; Peng, K. W.; Wu, G. J.; Zhang, F. A.; Kang, N. K.


Book ID
121089438
Publisher
American Institute of Physics
Year
2002
Tongue
English
Weight
407 KB
Volume
92
Category
Article
ISSN
0021-8979

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