Transmission Electron Microscopy Study o
Transmission Electron Microscopy Study of Thermally Annealed Low Resistance Magnetic Tunnel Junction
✍
Kyung, H. ;Lee, J.H. ;Yoon, C.S. ;Kim, C.K.
📂
Article
📅
2002
🏛
John Wiley and Sons
🌐
English
⚖ 296 KB
👁 1 views
Low-resistance magnetic tunneling junctions consisting of Ta/NiFe/Cu/NiFe/IrMn/CoFe/Al (6.6 and 7.7 A)-oxide/CoFe/NiFe/Ta were fabricated with the plasma-oxidized insulation layer. Electrical properties and microstructure of the junctions are characterized before and after annealing the junction at