Magnetic properties of large-area particle arrays fabricated using block copolymer lithography
✍ Scribed by Cheng, J.Y.; Ross, C.A.; Thomas, E.L.; Smith, H.I.; Lammertink, R.G.H.; Vancso, G.J.
- Book ID
- 121341117
- Publisher
- IEEE
- Year
- 2002
- Tongue
- English
- Weight
- 206 KB
- Volume
- 38
- Category
- Article
- ISSN
- 0018-9464
No coin nor oath required. For personal study only.
📜 SIMILAR VOLUMES
## Abstract Metal‐assisted etching is used in conjunction with block‐copolymer lithography to create ordered and densely‐packed arrays of high‐aspect‐ratio single‐crystal silicon nanowires with uniform crystallographic orientations. Nanowires with diameters and spacings down to 19 nm and 10 nm, res
## Abstract Typically, nanopatterning on plastic substrates has poor fidelity, poor adhesion, and low yield. Here the proposal of and the first experiment using a new fabrication method that overcomes the above obstacles and has achieved arrays of 60‐nm‐diameter, perfectly round metal dots over a l