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Magnetic and electronic properties of thin iron oxide films

✍ Scribed by M. Domke; B. Kyvelos; G. Kaindl

Publisher
Elsevier Science
Year
1983
Weight
126 KB
Volume
126
Category
Article
ISSN
0167-2584

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Iron thin films have been grown by DC magnetron sputtering using Si(100) wafers as substrates, and then oxidized in a well-controlled oxygen atmosphere in the vacuum chamber. Film thickness is about 50 nm, and grains forming these samples do not exceed 20 nm. In order to control structural propertie