Low temperature plasma nitridation of thin thermal SiO2 and a silicon surface with native oxide : E. Atanassova, J. Kassabov and E. Goranova. Microelectron. J.21(1), 5 (1990)

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 120 KB
• Volume: 30
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(90)90364-s