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Low-temperature oxidative degradation of low-dimensional zirconium and hafnium tellurides

✍ Scribed by H. Fjellvåg; S. Furuseth; A. Kjekshus; T. Rakke

Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
410 KB
Volume
63
Category
Article
ISSN
0038-1098

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✍ L. Pereira; P. Barquinha; E. Fortunato; R. Martins 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 236 KB

In this work hafnium oxide (HfO 2 ) was deposited by r.f. magnetron sputtering at room temperature and then annealed at 200 1C in forming gas (N 2 +H 2 ) and oxygen atmospheres, respectively for 2, 5 and 10 h. After 2 h annealing in forming gas an improvement in the interface properties occurs with