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Low temperature oxidation behavior of reactively sputtered TiN by x-ray photoelectron spectroscopy and contact resistance measurements

✍ Scribed by Ernsberger, C.

Book ID: 126775220
Publisher: AVS (American Vacuum Society)
Year: 1986
Tongue: English
Weight: 644 KB
Volume: 4
Category: Article
ISSN: 0734-2101
DOI: 10.1116/1.573679

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